Carl Zeiss – Carl Zeiss Microscopy is introducing ORION NanoFab at the European Microscopy Congress (EMC) in Manchester, UK. It is the first multi-ion-beam tool based on Gas Field Ion Source (GFIS) technology. As a major enhancement to the existing helium ion microscope, ORION NanoFab also utilizes neon ions.
The neon ion beam offers precise machining and nano-fabrication capabilities due to higher sputter yields in ion beam milling and faster resist exposure in ion beam lithography. The helium ion beam allows sub-10 nm nanofabrication as well as high resolution imaging capability in the same instrument. The optional state-of-the-art gallium FIB column allows massive material removal. This makes ORION NanoFab the most versatile nano-fabrication and imaging platform available.
“I have finally found the system that I was looking for the past five years,” says Dr. Qianjin Wang from the Physics Department at Nanjing University in China. “As a gallium FIB user for past ten years, I feel lucky that I will be at the forefront of revolution in the nanoworld as I focus on my research on optical properties of artificial nanoscale structures.”
- Carl Zeiss Microscopy Launches Orion NanoFab Multi-Ion Beam Tool at EMC (azonano.com)
- Nanofabrication reaches new complexity (nanotechweb.org)
- Veeco’s SPECTOR-HT Ion Beam Deposition System Qualified for Mass Production of Optical Filters (azonano.com)
- Complex quasicrystals created using new nanofabrication technique (physicsworld.com)